Formation and Optimization of Shallow Junctions by Ion Implantation and Rapid Thermal Annealing for CMOS Application
- 1 January 1991
- journal article
- Published by Trans Tech Publications, Ltd. in Solid State Phenomena
- Vol. 1-2, 159-168
- https://doi.org/10.4028/www.scientific.net/ssp.1-2.159
Abstract
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