Impurity distribution profiles in ion-implanted silicon

• 15 March 1968
• journal article
• Published by Canadian Science Publishing in Canadian Journal of Physics
• Vol. 46  (6) , 597-606
• https://doi.org/10.1139/p68-074

Abstract

Keywords

• IMPURITIES
• PHOSPHORUS
• DISTRIBUTION
• CRYSTALS
• ION IMPLANTATION
• NITROGEN
• IONS
• ARSENIC
• ION BEAM