The Electrodeposition of Chromium from Trivalent Salts

Abstract
The paper reports work on the electrodeposition of decorative chromium coatings from solutions of trivalent chromium compounds. Work on aqueous sulphate-based electrolytes showed that pH maintenance was the critical factor governing the production of sound decorative deposits. Wholly aqueous solutions could not be stabilized by buffers of the usual kind. Dimethylamido buffers were found to stabilize the pH of chromic chloride solutions at an acceptable value for plating. A solution based on aqueous chromic chloride containing 40% v/v of of dimethylformamide (DMF), one of these buffers, has been developed and possesses excellent plating characteristics.

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