Image reversal resist for g-line exposure: Chemistry and lithographic evaluation.

• 1 January 1989
• journal article
• Published by Technical Association of Photopolymers, Japan in Journal of Photopolymer Science and Technology
• Vol. 2  (3) , 417-428
• https://doi.org/10.2494/photopolymer.2.417

Abstract

Keywords

• LITHOGRAPHIC EVALUATION
• LINE EXPOSURE
• IMAGE REVERSAL RESIST
• CHEMISTRY