The Deposition of Tantalum and Columbium from their Volatilized Halides
- 1 January 1948
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 93 (6) , 258-265
- https://doi.org/10.1149/1.2773813
Abstract
The general conditions for obtaining adherent, ductile, nonporous coatings of tantalum and columbium by hydrogen reduction of their pentachlorides are discussed. Deposits up to 0.030 inch (0.76 mm.) or more in thickness have been obtained on copper, iron, alloy steels, nickel, molybdenum, and ceramic bases at rates up to 0.0003 inch (0.008 mm.) per minute and efficiencies up to GO per cent. The forms coated include wire, rod, sheet, block, tube, and crucible. Some of the chemical and physical properties of the plates are described, and micrographic and X‐ray diffraction studies of a few deposits are presented.Keywords
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