Formation of optical slab waveguides using thermal oxidation of SiO x
- 15 April 1993
- journal article
- Published by Institution of Engineering and Technology (IET) in Electronics Letters
- Vol. 29 (8) , 714-716
- https://doi.org/10.1049/el:19930478
Abstract
A novel method for the fabrication of optical slab waveguides is presented. After growth of the base cladding by thermal oxidation and deposition of the core layer of the waveguide by PECVD of SiOx, the top cladding layer is formed from the core layer material by an additional thermal oxidation which transforms SiOx, into SiO2. With this simple technology, contaminations and rough interfaces between core and cladding are avoided. Low propagation losses and good matching to optical fibres are achieved.Keywords
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