Repair of opaque defects in photomasks using focused ion beams
- 14 September 1987
- journal article
- Published by IOP Publishing in Journal of Physics D: Applied Physics
- Vol. 20 (9) , 1207-1209
- https://doi.org/10.1088/0022-3727/20/9/021
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Focused ion beam repair techniques for clear and opaque defects in masksMicroelectronic Engineering, 1985
- Application of a focused ion beam system to defect repair of VLSI masksJournal of Vacuum Science & Technology B, 1985
- Projected range distributions of implanted ions in multilayer targetsJournal of Physics C: Solid State Physics, 1984