Microstructural observations of sputtered silicon-tin-hydrogen alloys
- 15 August 1984
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 56 (4) , 1220-1223
- https://doi.org/10.1063/1.334053
Abstract
Structural and compositional properties of hydrogenated silicon-tin alloys have been investigated as a function of tin content, sputtering pressure, and presence of hydrogen. Transmission electron microscopy, energy dispersive x-ray microanalysis, and scanning electron microscopy were used to detect compositional and structural inhomogeneities in these materials.This publication has 6 references indexed in Scilit:
- Properties of amorphous hydrogenated silicon-tin alloys prepared by radio frequency sputteringJournal of Applied Physics, 1984
- Dependence of the microstructure of amorphous silicon thin films prepared by planar rf magnetron sputtering on deposition parametersJournal of Applied Physics, 1983
- Mössbauer spectroscopy of amorphous silicon–tin–hydrogen alloysJournal of Applied Physics, 1983
- Evolution of microstructure in amorphous hydrogenated siliconJournal of Applied Physics, 1982
- Microstructure of plasma-deposited a-Si : H filmsApplied Physics Letters, 1979
- Influence of deposition conditions on sputter-deposited amorphous siliconJournal of Applied Physics, 1978