Process optimization of a chemically amplified negative resist for electron beam exposure and mask making applications
- 1 May 1999
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 46 (1-4) , 375-378
- https://doi.org/10.1016/s0167-9317(99)00108-2
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Process development of sub-0.5 μm nonvolatile magnetoresistive random access memory arraysJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1997
- Scattering with angular limitation projection electron beam lithography for suboptical lithographyJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1997