The Epitaxial Growth and Properties of Silicon on Stoichiometric Spinel and Sapphire Substrates Using Silane-Helium Mixtures vs. Silane-Hydrogen Mixtures

Publisher Website
Google Scholar
Abstract
Epitaxial growth of silicon on (111) and (100) stoichiometric spinel, , (0001), and sapphire using silane in helium has been studied. (100) Si seems to be more compatible with sapphire than (111) Si, and exactly the opposite is true with sloichiometric spinel. Higher growth rate is preferred for epitaxial growth on sapphire and lower growth rate is favored for growth on stoichiometric spinel. Silicon films grown in hydrogen tend to have a smoother surface than that grown in helium, but larger contamination and interdiffusion effects. Lower optimum growth temperatures have also been observed for the silicon growth in helium than in hydrogen.

This publication has 0 references indexed in Scilit: