Laser-induced damage in dielectrics with nanosecond to spupicosecond pulses I: experimental

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Abstract
We report extensive laser-induced damage threshold measurements on pure and multilayer dielectrics at 1053 and 526 nm for pulse durations, (tau) , ranging from 140 fs to 1 ns. Qualitative differences in the morphology of damage and a departure from the diffusion-dominated (tau) 1/2 scaling indicate that damage results from plasma formation and ablation for (tau) 50 ps. A theoretical model based on electron production via multiphoton ionization, Joule heating, and collisional (avalanche) ionization is in good agreement with both the pulsewidth and wavelength scaling experimental results.

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