Resist technology for deep‐etch synchrotron radiation lithography

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1 January 1989

journal article
photosensitive polymers
Published by Wiley in Makromolekulare Chemie. Macromolecular Symposia

Vol. 24 (1) , 231-240
https://doi.org/10.1002/masy.19890240124

Abstract

No abstract available

Keywords

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Fabrication of microstructures with high aspect ratios and great structural heights by synchrotron radiation lithography, galvanoforming, and plastic moulding (LIGA process)
Microelectronic Engineering, 1986