Characterization of potassium tantalum niobate films formed by metalorganic deposition
- 15 July 1992
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 72 (2) , 615-619
- https://doi.org/10.1063/1.351842
Abstract
No abstract availableThis publication has 30 references indexed in Scilit:
- Focused ion beam high T c superconductor dc SQUIDsApplied Physics Letters, 1991
- Preparation and properties of PLZT films from metallo-organic precursorsFerroelectrics, 1989
- Pyroelectric linear array infrared sensors made of c-axis-oriented La-modified PbTiO3 thin filmsJournal of Applied Physics, 1988
- KTN optical waveguides grown by liquid-phase epitaxyElectronics Letters, 1986
- Crystal growth and characterization of “striation-free” KTa1−xNbxO3 (x ≈ 0.26) solid solutionsJournal of Crystal Growth, 1983
- Characteristics of KTN Pyroelectric DetectorsJournal of the Optical Society of America, 1972
- Field-dependent dielectric properties of KTaxNb1-xO3IEEE Transactions on Electron Devices, 1969
- Study of Ferroelectric Transitions of Solid-Solution Single Crystals of KNb-KTaPhysical Review B, 1959
- Triple Hysteresis Loops and the Free-Energy Function in the Vicinity of the 5°C Transition in BaTiPhysical Review B, 1956
- Rochelle Salt as a DielectricPhysical Review B, 1930