Novel Transparent and Electroconductive Amorphous Semiconductor: Amorphous AgSbO3 Film

Abstract
Amorphous AgSbO3 films prepared by RF sputtering under O2 gas plasma and by subsequent postannealing at 500° C in O2 gas flow were found to be novel transparent and electroconductive amorphous semiconductors. The optical band gap of the films was ∼2.3 eV. The electrical conductivity was ∼10-1 Ω-1· cm-1 at room temperature and its temperature dependence showed thermal activation-type behavior with an activation energy of ∼0.23 eV. Hall measurements indicated n-type conduction. Concentration of carrier electrons and the Hall mobility at room temperature of the sample were ∼3×1017 cm-3 and ∼7 cm2·V-1·s-1, respectively. The value of the mobility was close to that of the polycrystalline films ( ∼8 cm2·V-1·s-1).