Fully large-scale integration-process-compatible Si field emitter technology with high controllability of emitter height and sharpness
- 1 March 1997
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 15 (2) , 488-490
- https://doi.org/10.1116/1.589605
Abstract
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