Photocatalytic degradation rate of oxalic acid on a semiconductive layer of n-TiO2 particles in a batch mode plate photoreactor Part II: Light intensity limit
- 1 January 1999
- journal article
- Published by Springer Nature in Journal of Applied Electrochemistry
- Vol. 29 (4) , 429-435
- https://doi.org/10.1023/a:1003464207063
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