High Rate and Low Radiation Damage Film Deposition by Compressed Magnetic Field (CMF) Magnetron Sputtering
- 1 January 1983
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 22 (S1)
- https://doi.org/10.7567/jjaps.22s1.505
Abstract
A new CMF-magnetron sputtering technique has been described. Taking ZnO film deposition as an example, optical properties of ZnO films are measured by the propagation of He–Ne laser beam in waveguide mode. It is clarified that a smooth surface film is deposited very rapidly by this technique. Radiation damage of the substrate is examined by the C-V characteristics of the MZOS structure. The shift of the flat-band voltage is only 1.5 V. The surface-states distribution after ZnO film deposition almost agrees with original MOS structure. This technique will be applicable to the VLSI processes.Keywords
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