Influences of D.C. bias on aluminum films prepared with a high rate magnetron sputtering cathode
- 1 July 1985
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 129 (3-4) , 309-314
- https://doi.org/10.1016/0040-6090(85)90058-6
Abstract
No abstract availableThis publication has 2 references indexed in Scilit:
- Evolution and Current Status of Aluminum MetallizationJournal of the Electrochemical Society, 1976
- Contamination in Films Sputtered From Hot-Pressed TargetsJournal of Vacuum Science and Technology, 1971