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Summary Abstract: Precursor adsorption of oxygen on Si(111) at low temperatures
Home
Publications
Summary Abstract: Precursor adsorption of oxygen on Si(111) at low temperatures
Summary Abstract: Precursor adsorption of oxygen on Si(111) at low temperatures
CS
C. Silvestre
C. Silvestre
MS
M. Shayegan
M. Shayegan
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1 May 1988
journal article
Published by
American Vacuum Society
in
Journal of Vacuum Science & Technology A
Vol. 6
(3)
,
798-800
https://doi.org/10.1116/1.575125
Abstract
No abstract available
Cited
Cited by 2 articles
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