UV-laser photolysis of trimethylaluminum for Al film growth

This publication has 12 references indexed in Scilit:

• Photodeposition of aluminum oxide and aluminum thin films
  Applied Physics Letters, 1983
• Vapor Phase Deposition of Aluminum Film on Quartz Substrate
  Journal of the Electrochemical Society, 1983
• Photodeposition of metal films with ultraviolet laser light
  Journal of Vacuum Science and Technology, 1982
• Low-temperature growth of polycrystalline Si and Ge films by ultraviolet laser photodissociation of silane and germane
  Applied Physics Letters, 1982
• Laser microphotochemistry for use in solid-state electronics
  IEEE Journal of Quantum Electronics, 1980
• The prototype aluminum–carbon single, double, and triple bonds: Al–CH3, Al=CH2, and Al≡CH
  The Journal of Chemical Physics, 1980
• The Description of Chemical Bonding From AB Initio Calculations
  Annual Review of Physical Chemistry, 1978
• Predissociation effects in the A, B, and C states of CH and the interstellar formation rate of CH via inverse predissociation
  The Astrophysical Journal, 1976
• Anisotropic Photodissociation of Cadmium Dimethyl
  The Journal of Chemical Physics, 1971
• A Gas Phase Electron Diffraction Investigation of the Molecular Structures of Trimethylaluminium Monomer and Dimer.
  Acta Chemica Scandinavica, 1971