Incorporation of water into vapour deposited oxide films
- 1 February 1966
- journal article
- research article
- Published by Elsevier in Solid-State Electronics
- Vol. 9 (2) , 180-181
- https://doi.org/10.1016/0038-1101(66)90090-6
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Glow Discharge Formation of Silicon Oxide and The Deposition of Silicon Oxide Thin Film Capacitors by Glow Discharge TechniquesJournal of the Electrochemical Society, 1965
- High‐Pressure Effects on Oxide Glasses: I, Densification in Rigid StateJournal of the American Ceramic Society, 1963