High reflectivity dielectric mirror deposition by reactive magnetron sputtering

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Abstract
We use room temperature reactive sputter deposition from a silicon target to deposit Si, Si3N4, and SiO2 layers. The resulting amorphous layers are grown to form highly reflecting dielectric mirrors and used for coating end facets of layers. Among the advantages of our computer controlled sputter deposition process are the reproducibly excellent optical quality, good adhesion properties together with high chemical and thermal stability of the deposited films. We use Si/SiO2 mirrors for broadband infrared distributed Bragg reflectors and Si3N4/SiO2 multilayers in the visible wavelength range. The high (≳99%) reflectivities which are obtained from these mirrors make them suitable for use in vertical-cavity surface emitting and low-threshold edge-emitting lasers.

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