XRD Characterization of thin films with low intensity reflection lines
- 1 October 1996
- Vol. 47 (10) , 1145-1147
- https://doi.org/10.1016/0042-207x(96)00193-5
Abstract
No abstract availableKeywords
This publication has 1 reference indexed in Scilit:
- Production of Ti films with controlled textureSurface and Coatings Technology, 1995