Calculation of Evaporated Film Thickness Distribution on Nonplanar Surfaces for Variable Angle Vapor Incidence

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Abstract
Equations which express evaporated film thickness ratios at various locations on nonplanar surfaces as a function of the substrate tilt angle are derived. The dependence of these ratios on the angle between the plane-normal and the direction of a uniform, unidirectional vapor stream is determined, as is the integrated effect of rotation of the plane about a normal. The conditions for improved coverage of step edges and on the plane between steps are indicated.

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