Measurement of porous silicon thermal conductivity by micro-Raman scattering
- 15 October 1999
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 86 (8) , 4700-4702
- https://doi.org/10.1063/1.371424
Abstract
We present a noncontact and nondestructive method to measure thermal conductivity in layered materials using micro-Raman scattering. This method was successfully applied to monocrystalline silicon whose thermal conductivity was found to be 63 W/m K at about 550 °C and then applied to porous silicon layers. For a 50 μm thick layer with 50% porosity, we found a thermal conductivity of 1 W/m K confirming the thermal insulating properties of this material.This publication has 18 references indexed in Scilit:
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