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Amorphous CVD Al2 O 3 Films by Ta‐Doping and Their Physicochemical Properties
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Amorphous CVD Al2 O 3 Films by Ta‐Doping and Their Physicochemical Properties
Amorphous CVD Al2 O 3 Films by Ta‐Doping and Their Physicochemical Properties
PT
Paul J. Tsang
Paul J. Tsang
RA
Ronald M. Anderson
Ronald M. Anderson
SC
Serge Cvikevich
Serge Cvikevich
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1 January 1976
journal article
Published by
The Electrochemical Society
in
Journal of the Electrochemical Society
Vol. 123
(1)
,
57-63
https://doi.org/10.1149/1.2132765
Abstract
No abstract available
Cited
Cited by 7 articles
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