Droplet-target laser-plasma source for proximity x-ray lithography
- 6 May 1996
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 68 (19) , 2627-2629
- https://doi.org/10.1063/1.116203
Abstract
A compact, high-brightness and practically debris-free laser-plasma soft x-ray source for proximity x-ray lithography is described. The target of the source is small liquid fluorocarbon droplets injected into vacuum with a piezoelectrically vibrated nozzle. Emission from helium- and hydrogenlike fluorine in the 1.2–1.7 nm wavelength range was determined to ∼2×1012 photons/(sr-pulse), which corresponds to a conversion efficiency of ∼5% of the 70 mJ laser pulse. Exposure of a copolymer of PMMA–MAA confirms the measured photon flux. Debris production was approximately 70 pg/sr pulse. The applicability of the source for dedicated lithography systems is discussed.Keywords
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