Ionic implantation of N2+ in Ni(110) at 300 K
- 1 June 1982
- journal article
- Published by Elsevier in Surface Science
- Vol. 118 (3) , 682-696
- https://doi.org/10.1016/0039-6028(82)90215-1
Abstract
No abstract availableThis publication has 28 references indexed in Scilit:
- Molecular and dissociative chemisorption of N2 on Ni(110)Surface Science, 1979
- Electronic properties of adsorbed layers of nitrogen, oxygen, and sulfur on copper (100)Physical Review B, 1977
- X-ray photoelectron spectroscopic observation of nitrogen-containing gases adsorbed at high pressures on some transition metalsJournal of Electron Spectroscopy and Related Phenomena, 1977
- XPS and UPS studies of the interaction of nitrogen‐containing molecules with nickel: The use of binding energy patterns and relative intensities to diagnose surface speciesJournal of Vacuum Science and Technology, 1976
- Surface Molecular-Orbital Excitations in Electron Energy-Loss SpectraPhysical Review Letters, 1971
- LEED studies of adsorption on clean (100) copper surfacesSurface Science, 1965
- Adsorption of Gases Activated by Electron ImpactThe Journal of Chemical Physics, 1964
- Auger Electron Ejection from Tungsten Surfaces by Low-Energy IonsPhysical Review B, 1963
- Oxygen-Nickel Structures on the (110) Face of Clean NickelJournal of Applied Physics, 1962
- Tests for Chemisorption of Nitrogen on a Clean (100) Nickel SurfaceThe Journal of Chemical Physics, 1961