Infrared optical properties of CVD diamond films

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Abstract
Diamond films of 15–20 μm thicknesses were prepared by microwave plasma enhanced chemical vapor deposition onto crystalline silicon substrates. The growth surfaces of the films were rough with polycrystalline crystallographic habits, while the substrate sides of these films were smooth and featureless as viewed by optical microscopy. A heated cast iron scaife was used to polish the rough growth surfaces, and free-standing films were removed from the silicon substrates by dissolving the silicon in an aqueous HF. Both infrared optical transmission and reflection spectra were measured over the range of 600–4000 cm−1. For polished films, near 70% transmittance was obtained over the whole range, while the transmittance for nonpolished films was much lower and varied strongly with the wave number. Absorptions due to carbon-hydrogen stretching bands as well as a silicon carbide phase were observed in the transmission spectra. The optical absorption coefficient and the refractive index were found to vary from as high as 150 to as low as 7 cm−1 and 2.41 to 2.49, respectively (depending on the film quality and the wave number). A weak signature of the two-phonon absorption band of diamond was observed. The relationship between deposition conditions and infrared optical properties of diamond films before as well as after polishing is discussed.

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