A newly developed linear ion implanter for industrial applications
- 15 August 1989
- journal article
- Published by Elsevier in Materials Science and Engineering: A
- Vol. 116, 205-208
- https://doi.org/10.1016/0921-5093(89)90147-0
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Some practical aspects of ion implantation for wear reductionNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1985
- Electron cyclotron wave resonances and power absorption effects in electrodeless low pressure h.f. plasmas with a superimposed static magnetic fieldPlasma Physics, 1974