TiO_2–SiO_2 mixed films prepared by the fast alternating sputter method
- 1 August 1991
- journal article
- Published by Optica Publishing Group in Applied Optics
- Vol. 30 (22) , 3233-3237
- https://doi.org/10.1364/ao.30.003233
Abstract
We introduced the fast alternating sputter method and its application on deposition of TiO2–SiO2 mixed films. By using fast alternating sputter, the TiO2 and SiO2 were completely mixed in the film, and no thin-pair structure could be found by x-ray diffraction. The structure of the mixed films was amorphous in a wide composition range. The optical properties of the mixed films in the visible and near infrared changed from SiO2-dominant to TiO2-dominant TiO2 content in the film increased.Keywords
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