Determination of properties of thin thermal SiO2 on silicon by spectroscopic ellipsometry
- 1 January 1991
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 195 (1-2) , 185-192
- https://doi.org/10.1016/0040-6090(91)90270-8
Abstract
No abstract availableKeywords
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