A Study on Modified Silicon Surface after CHF3/C2F6 Reactive Ion Etching

• 1 April 1994
• journal article
• research article
• Published by Wiley in ETRI Journal
• Vol. 16  (1) , 45-57
• https://doi.org/10.4218/etrij.94.0194.0014

Abstract

Keywords

• SILICON SURFACE
• FLUORINE
• NF3
• TREATMENTS
• ETCHING
• RIE
• CONTAMINATED
• NM THICKNESS