The effect of reactor configuration on the oxygen plasma conversion of an organosilicon to SiO2
- 30 April 1986
- journal article
- Published by Elsevier in Materials Letters
- Vol. 4 (3) , 154-158
- https://doi.org/10.1016/0167-577x(86)90007-8
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- O2 plasma-converted spin-on-glass for planarizationJournal of Vacuum Science & Technology B, 1985
- Oxygen impurity effects at metal/silicide interfaces: Formation of silicon oxide and suboxides in the Ni/Si systemJournal of Vacuum Science and Technology, 1981
- Local atomic and electronic structure of oxide/GaAs and SiO2/Si interfaces using high-resolution XPSJournal of Vacuum Science and Technology, 1979