Further Verification of a Model for Diffusion from Doped Oxides

• 1 January 1970
• journal article
• Published by The Electrochemical Society in Journal of the Electrochemical Society
• Vol. 117  (2) , 258-259
• https://doi.org/10.1149/1.2407479

Abstract

Keywords

• SEMICONDUCTOR MATERIALS
• OXYGEN COMPOUNDS
• DOPING
• DIFFUSION
• SILICON
• MODELLING