High quality fluorinated silicon oxide films prepared by plasma enhanced chemical vapor deposition at 120 °C
- 23 September 1996
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 69 (13) , 1876-1878
- https://doi.org/10.1063/1.117463
Abstract
No abstract availableKeywords
This publication has 0 references indexed in Scilit: