Slow laser deposition of high quality ErBa2Cu3O7−x thin films

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Abstract
High quality ErBa2Cu3O7−x thin films were grown by reactive laser deposition on yttria-stabilized zirconia substrate. The structural and electrical properties of the samples were investigated by x-ray double-crystal diffractometry, texture analysis and reciprocal space mapping, and resistivity measurements, respectively. The best films were obtained by using high substrate temperature combined with a low fluence and low laser repetition rate. In these conditions the deposition rate results were very low, namely <0.25 Å/s. We found that in this case we can grow films with a very high degree of crystalline perfection. Preliminary results show that this process promotes the fabrication of very thick films (thickness ≳500 nm) which are highly c-axis oriented.

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