New application of Se-Ge glasses to silicon microfabrication technology
- 1 February 1976
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 28 (3) , 145-147
- https://doi.org/10.1063/1.88669
Abstract
A selective etching effect due to photoexposure of Se‐Ge glass films was found. The possibilities of applying this phenomenon to the patterning of layers for silicon device processing and for the fabrication of photomasks were investigated. The results showed that the Se‐Ge glass has certain advantages in these applications.Keywords
This publication has 3 references indexed in Scilit:
- Photoexpansion and ``thermal contraction'' of amorphous chalcogenide glassesApplied Physics Letters, 1974
- A reversible optical change in the AsSeGe glassJournal of Non-Crystalline Solids, 1973
- Optically Induced Reversible Change in Amorphous SemiconductorsJapanese Journal of Applied Physics, 1972