Recent advances in silicon etching for MEMS using the ASE™ process
- 20 April 1999
- journal article
- Published by Elsevier in Sensors and Actuators A: Physical
- Vol. 74 (1-3) , 13-17
- https://doi.org/10.1016/s0924-4247(98)00326-4
Abstract
No abstract availableThis publication has 1 reference indexed in Scilit:
- Advanced silicon etching using high-density plasmasPublished by SPIE-Intl Soc Optical Eng ,1995