Investigation of thermal oxide films of silicon by infrared absorption
- 16 June 1972
- journal article
- research article
- Published by Wiley in Physica Status Solidi (a)
- Vol. 11 (2) , 783-786
- https://doi.org/10.1002/pssa.2210110244
Abstract
No abstract availableKeywords
This publication has 10 references indexed in Scilit:
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- Growth and Structure of Si Oxide Films on Si SurfaceJapanese Journal of Applied Physics, 1963
- The Oxidation of Silicon in Dry Oxygen, Wet Oxygen, and SteamJournal of the Electrochemical Society, 1963
- Gas Permeation Study and Imperfection Detection of Thermally Grown and Deposited Thin Silicon Dioxide FilmsJournal of the Electrochemical Society, 1962
- Infrared Lattice Bands of QuartzPhysical Review B, 1961
- Stabilization of Silicon Surfaces by Thermally Grown Oxides*Bell System Technical Journal, 1959
- Infrared studies on polymorphs of silicon dioxide and germanium dioxideJournal of Research of the National Bureau of Standards, 1958
- Study of the Structure of Quartz, Cristobalite, and Vitreous Silica by Reflection in InfraredThe Journal of Chemical Physics, 1953