Formation of Silicon Nitride at a Si ‐ SiO2 Interface during Local Oxidation of Silicon and during Heat‐Treatment of Oxidized Silicon in NH 3 Gas
- 1 July 1976
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 123 (7) , 1117-1120
- https://doi.org/10.1149/1.2133008