Statistical metrology: understanding spatial variation in semiconductor manufacturing

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Abstract
Variation is playing an increasingly important role in microelectronics manufacturing; variation not only impacts yield but also limits performance and reliability. Statistical metrology is an emerging body of methods for the systematic characterization and study of variation in semiconductor manufacturing. This paper considers the key elements of statistical metrology and reviews current progress in these areas, including (1) measurement methods and data gathering, (2) variation modeling and data analysis, and (3) study of the impact of variation. Potential applications of the methodology are widespread, with significant existing work in equipment characterization, layout optimization, and circuit impact analysis. Statistical metrology is an exciting new area of research that will play a critical role in future design and manufacture practice.

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