Electron energy-loss spectroscopy analysis of low-temperature plasma-enhanced chemically vapor deposited a-C:H films

1 May 1989

journal article
Published by American Vacuum Society in Journal of Vacuum Science & Technology A

Vol. 7 (3) , 1350-1352
https://doi.org/10.1116/1.576284

Abstract

Electron energy‐loss spectroscopy (EELS) has been applied to the analysis of a‐C:H films grown on various substrates by a unique low‐temperature (sp³ carbon bonding to threefold coordinated sp² carbon bonding as well as the relative order/disorder due to substrate effects. Ellipsometric and transmission measurements provide optical constants for the PECVD a‐C:H films.

Keywords

CARBON
AMORPHOUS STATE
HYDROGEN ADDITIONS
THIN FILMS
CHEMICAL VAPOR DEPOSITION
CHEMICAL BONDS
MEDIUM TEMPERATURE
ORDER PARAMETERS
ELECTRON SPECTROSCOPY
ENERGY−LOSS SPECTROSCOPY
EXPERIMENTAL DATA

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