Automatic Thin Film Vacuum Deposition System of High Stability
- 1 September 1964
- journal article
- research article
- Published by AIP Publishing in Review of Scientific Instruments
- Vol. 35 (9) , 1147-1150
- https://doi.org/10.1063/1.1718983
Abstract
An automatic thin film vacuum deposition system is described which permits films of preselected thickness, in the range of 50 to 1500 Å, to be deposited automatically at selected rates between 0.1 and 10 Å/sec. The long time repeatability of the system lies within ±10 Å of the selected thickness.Keywords
This publication has 1 reference indexed in Scilit:
- Method of Measuring and Controlling Evaporation Rates during the Production of Thin Films in VacuumReview of Scientific Instruments, 1961