Surface Contamination of Silicon Produced by Ion Implantation

• 1 February 1976
• journal article
• Published by IOP Publishing in Japanese Journal of Applied Physics
• Vol. 15  (2) , 365-372
• https://doi.org/10.1143/jjap.15.365

Abstract

Keywords

• AMORPHOUS CARBON
• ION IMPLANTATION
• CURRENT DENSITY