Approach for semicustom integrated-sensor system manufacturing in a commercial CMOS technology

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Abstract
In this work the development of a design and manufacturing methodology for application-specific integrated sensor systems in silicon, that extends the ASIC standard cell approach for circuits, is presented. The standard design environment of a commercial foundry is used. A library of micromachined sensors and specific interface circuit cells has been added to the foundry's libraries. A fabrication structure has been set up in which the CMOS foundry process is followed by a micromachining post-processing transparent to the user. This includes back-side membrane fabrication. A number of standard sensor cell types have been developed: ISFET chemical sensors, gas flow and infrared radiation sensors based on thermopiles and piezoresistive pressure sensors. Mass-beam structures suitable for accelerometer devices have also been fabricated.

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