Origin of In-Plane Texturing in Sputtered Mo Films
- 1 January 1995
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
No abstract availableKeywords
This publication has 9 references indexed in Scilit:
- Combined transmission electron microscopy and x-ray study of the microstructure and texture in sputtered Mo filmsJournal of Applied Physics, 1994
- Preparation of biaxially aligned cubic zirconia films on pyrex glass substrates using ion-beam assisted depositionJournal of Applied Physics, 1993
- Relationship between texture and electromigration lifetime in sputtered AI-1% Si thin filmsJournal of Electronic Materials, 1993
- Correlation of texture with electromigration behavior in Al metallizationApplied Physics Letters, 1991
- Argon gas pressure dependence of the columnar grain structure in iron films deposited obliquely by sputteringThin Solid Films, 1991
- Theory of thin-film orientation by ion bombardment during depositionJournal of Applied Physics, 1986
- Alignment of thin films by glancing angle ion bombardment during depositionApplied Physics Letters, 1985
- Columnar microstructure in vapor-deposited thin filmsThin Solid Films, 1977
- A Direct Method of Determining Preferred Orientation of a Flat Reflection Sample Using a Geiger Counter X-Ray SpectrometerJournal of Applied Physics, 1949