Ion implanted, outdiffusion produced diamond thin films
- 4 January 1993
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 62 (1) , 34-36
- https://doi.org/10.1063/1.108810
Abstract
A thin film, produced by carbon ion implantation and outdiffusion at the temperature of irradiation, has been confirmed to be diamond using micro-Raman spectroscopy and electron diffraction. The Raman spectra contained a definitive diamond peak shifted slightly from that of natural diamond. This shift may be due to residual strain and is consistent with the broad linewidth. Fragments of the film over a micron in size were examined with transmission electron microscopy and found to be untwinned, single crystals. The film had been produced on a polycrystalline copper substrate. The carbon ions were at an ion energy of 120 keV and the irradiation was carried out to a high dose.Keywords
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