The Influence of Silicon Surface Cleaning Procedures on Silicon Oxidation

• 1 April 1987
• journal article
• Published by The Electrochemical Society in Journal of the Electrochemical Society
• Vol. 134  (4) , 1031-1033
• https://doi.org/10.1149/1.2100563

Abstract

Keywords

• REACTION KINETICS
• HYDROGEN PEROXIDE
• WAFERS
• DENSITY
• REFRACTIVE INDEX
• SILICON
• OXIDATION