Novel Deposition Technique of a-Si: H –Silane Glow Discharge in Magnetic Field–

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Abstract
Optical emission spectra from the glow discharge of silane have been studied as a function of magnetic field applied to the plasma column. The result has revealed that the magnetic field remarkably affects not only the decomposition kinetics but also the structural properties of the resulting films. Further, the crystallization of phosphorus doped Si: H films is found to occur at a temperature below 200°C, under the deposition conditions of a low flow rate of silane and the presence of the magnetic field.

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